Electrostatic

Electrostatic

Commonly used for holding silicon wafers during lithography processes, an electrostatic chuck comprises a metal base-plate and a thin dielectric layer; the metal base-plate is maintained at a high-voltage relative to the wafer, and so an electrostatic force clamps the wafer to it. Electrostatic chucks may have pins, or mesas, the height of which is included in the reported dielectric thickness; a design by Sandia National Laboratory uses a patterned silicon-dioxide dielectric to form the pins.[6]